< BK21 플러스 BEST 정보기술 사업단 세미나 개최 안내 >

개최일시 : 2017년 04월 26일 수요일17:00 ~ 18:00

개최장소 : 제 1공학관 A653호

세미나 제목 : The development of the equipment and process technology for flexible displays

발표초록 :

Recently, flexible electronics have come close to being excellent applications because of their potential for developing thin, light-weight, and unbreakable properties. The recent rapid development of flexible electronics has been spurred by the continuous evolution of deposition system with application in flexible displays, electronic paper and wearable displays. The maximum process temperature of deposition system should be kept as low as possible under 150oC. In this study, we investigated systems at low temperature and damage process using new PVD source and PECVD source. Changes of ITO specific resistivity as a function of the process temperature using normal magnetron sputter and new PVD system is shown in figure 1. It shows superior electrical and optical quality of new PVD AOSs than Sputter at low temperature. In particular, the ITO resistivity (<2E-4ohm.cm) of new PVD system at 120oC shows a higher effect than sputter ITO films at 200 oC [1]. Figure 2 shows the result of WVTR (Water Vapor Transmission Rate) using new PECVD system. We acquired the excellent WVTR result in 1.27E-4g/m2day of the SiNx layer (300nm) at low temperature (Non heating type) [2]. Also super smooth surface and excellent uniformity applied to large area display is shown in the insert figure of figure 2. The new PECVD system is easy to control properties of flexible films available to use flexible devices and energetic atoms as a function of process conditions.

강연자 : 안경준 대표이사 / (주)에스엔텍

초청자 : 전기전자공학과 교수 김형준