| 2016-10 |
High-Throughput Screening to Investigate the Relationship between the Selectivity and Working Capacity of Porous Materials for Propylene/Propane Adsorptive Separation |
JOURNAL OF PHYSICAL CHEMISTRY C
|
| 2016-10 |
Effect of Al2O3 Deposition on Performance of Top-Gated Monolayer MoS2-Based Field Effect Transistor |
ACS APPLIED MATERIALS & INTERFACES
|
| 2016-09 |
Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization |
ACS NANO
|
| 2016-08 |
스퍼터로 성장된 알루미늄 박막의 공정 변수와 박막 두께에 따른 물성 |
Korean Journal of Materials Research
|
| 2016-08 |
Surface treatment process applicable to next generation graphene-based electronics |
CARBON
|
| 2016-07 |
Formation of Ni silicide from atomic layer deposited Ni |
CURRENT APPLIED PHYSICS
|
| 2016-07 |
Comparison of hydrogen sulfide gas and sulfur powder for synthesis of molybdenum disulfide nanosheets |
CURRENT APPLIED PHYSICS
|
| 2016-06 |
Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor |
JOURNAL OF MATERIALS SCIENCE
|
| 2016-05 |
High Efficiency n-Si/p-Cu2O Core-Shell Nanowires Photodiode Prepared by Atomic Layer Deposition of Cu2O on Well-Ordered Si Nanowires Array |
ELECTRONIC MATERIALS LETTERS
|
| 2016-05 |
Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment |
APPLIED PHYSICS LETTERS
|
| 2016-05 |
Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-Film Transistors |
IEEE ELECTRON DEVICE LETTERS
|
| 2016-03 |
Uniform, large-area self-limiting layer synthesis of tungsten diselenide |
2D MATERIALS
|
| 2016-03 |
Effects of Cl-based Ligand Structures on Atomic Layer Deposited HfO2 |
JOURNAL OF PHYSICAL CHEMISTRY C
|
| 2016-03 |
Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition |
APPLIED SURFACE SCIENCE
|
| 2016-02 |
A Separate Extraction Method for Asymmetric Source and Drain Resistances Using Frequency-Dispersive C-V Characteristics in Exfoliated MoS2 FET |
IEEE ELECTRON DEVICE LETTERS
|
| 2016-01 |
Static and Dynamic Performance of Complementary Inverters Based on Nanosheet α-MoTe2 p-Channel and MoS2 n-Channel Transistors |
ACS NANO
|
| 2016-01 |
Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides |
SCIENTIFIC REPORTS
|
| 2016-01 |
Area-selective chemical vapor deposition of Co for Cu capping layer |
CURRENT APPLIED PHYSICS
|
| 2015-12 |
High-Performance Alternating Current Electroluminescent layers Solution-blended with Mechanically and Electrically Robust Non-radiating Polymers |
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS
|
| 2015-10 |
The impact of atomic layer deposited SiO2 passivation for high-k Ta1-xZrxO on the InP substrate |
JOURNAL OF MATERIALS CHEMISTRY C
|
| 2015-09 |
Vapor Deposition Techniques for Synthesis of Two-Dimensional Transitin Metal Dichalcogenides |
한국현미경학회지
|
| 2015-09 |
Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices |
CHEMISTRY OF MATERIALS
|
| 2015-09 |
Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor |
APPLIED SURFACE SCIENCE
|
| 2015-09 |
Characterization of HfOxNythin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas |
APPLIED SURFACE SCIENCE
|
| 2015-07 |
Optimization and device application potential of oxide-metal-oxide transparent electrode structure |
RSC ADVANCES
|
| 2015-07 |
Controllable Synthesis of Molybdenum Tungsten Disulfide Alloy for Vertically Composition-Controlled Multilayer |
NATURE COMMUNICATIONS
|
| 2015-07 |
Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor |
APPLIED SURFACE SCIENCE
|
| 2015-07 |
Growth characteristics and properties of indium oxide and indium-doped zinc oxide by atomic layer deposition |
THIN SOLID FILMS
|
| 2015-05 |
In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides |
JOURNAL OF MATERIALS CHEMISTRY C
|
| 2015-05 |
Nitrogen-doped ZnO/n-Si core-shell nanowire photodiode prepared by atomic layer deposition |
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
|
| 2015-02 |
Lowering contact resistance by SWCNT-Al bilayer electrodes in solution processable metal-oxide thin film transistor |
JOURNAL OF MATERIALS CHEMISTRY C
|
| 2015-02 |
Plasma-enhanced atomic layer deposition of Co on metal surfaces |
SURFACE & COATINGS TECHNOLOGY
|
| 2015-01 |
Real-time detection of chlorine gas using Ni/Si shell/core nanowires |
NANOSCALE RESEARCH LETTERS
|
| 2015-01 |
Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition |
CHEMISTRY OF MATERIALS
|
| 2015-01 |
The formation of a dielectric SiNxCy sealing layer using an atomic layer deposition technique |
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
|
| 2015-01 |
Synthesis of carbon nanotube-nickel nanocomposites using atomic layer deposition for high-performance non-enzymatic glucose sensing |
BIOSENSORS & BIOELECTRONICS
|
| 2015-01 |
Layer-modulated synthesis of uniform tungsten disulfide nanosheet using gas-phase precursors |
NANOSCALE
|
| 2014-12 |
Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate |
APPLIED SURFACE SCIENCE
|
| 2014-11 |
Coupled self-assembled monolayer for enhancement of Cu diffusion barrier and adhesion properties |
RSC ADVANCES
|
| 2014-11 |
High efficiency n-ZnO/p-Si core-shell nanowire photodiode based on well-ordered Si nanowire array with smooth surface |
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
|
| 2014-10 |
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition |
JOURNAL OF ALLOYS AND COMPOUNDS
|
| 2014-08 |
Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process |
JOURNAL OF MATERIALS CHEMISTRY C
|
| 2014-07 |
Graphene as an atomically thin barrier to Cu diffusion into Si |
NANOSCALE
|
| 2014-04 |
ZnO homojunction core-shell nanorods ultraviolet photo-detecting diodes prepared by atomic layer deposition |
SENSORS AND ACTUATORS A-PHYSICAL
|
| 2014-04 |
The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration |
APPLIED SURFACE SCIENCE
|
| 2014-04 |
Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric |
APPLIED SURFACE SCIENCE
|
| 2014-04 |
Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition |
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
|
| 2014-03 |
Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursor |
NANOSCALE
|
| 2014-03 |
Review of plasma-enhanced atomic layer deposition: Technical enabler of nanoscale device fabrication |
JAPANESE JOURNAL OF APPLIED PHYSICS
|
| 2014-03 |
Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition |
APPLIED SURFACE SCIENCE
|
| 2014-03 |
Investigation of atomic layer deposition of magnesium oxide on a CoFeB layer for three-dimensional magnetic tunneling junctions |
JOURNAL OF ALLOYS AND COMPOUNDS
|
| 2014-02 |
Fabrication of Transferable Al2O3 Nanosheet by Atomic Layer Deposition for Graphene FET |
ACS APPLIED MATERIALS & INTERFACES
|
| 2014-01 |
Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires |
JOURNAL OF LUMINESCENCE
|
| 2013-12 |
Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition |
ACS Nano
|
| 2013-12 |
The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition |
APPLIED SURFACE SCIENCE
|
| 2013-12 |
Direct imprinting of MoS2 flakes on a patterned gate for nanosheet transistors |
JOURNAL OF MATERIALS CHEMISTRY C
|
| 2013-11 |
Alkali earth metal dopants for high performance and aqueous-derived ZnO TFT |
RSC Advances
|
| 2013-10 |
원자층 박막 증착법을 이용한 나노 소자 공정 및 물성 연구 |
인포메이션 디스플레이
|
| 2013-09 |
Growth Characteristics and Electrical Properties of Ta2O5 Grown by Thermal and O3-based Atomic Layer Deposition on TiN substrate for Metal-Insulator-Metal Capacitor Applications |
THIN SOLID FILMS
|
| 2013-09 |
Formation of vertically-aligned cobalt silicide nanowire arrays through a solid-state reaction |
IEEE TRANSACTIONS ON NANOTECHNOLOGY
|
| 2013-08 |
Exciton dynamics in atomically thin MoS2: inter-excitonic interaction and broadening kinetics |
PHYSICAL REVIEW B
|
| 2013-06 |
UV Visible Spectroscopic Analysis of Electrical Properties in Alkali Metal-Doped Amorphous Zinc Tin Oxide Thin-Film Transistors |
ADVANCED MATERIALS
|
| 2013-06 |
Atomic Layer Deposition of Transition Metals for Silicide Contact Formation: Growth Characteristics and Silicidation |
Microelectronic Engineering
|
| 2013-05 |
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor |
Journal of Energy Chemistry
|
| 2013-05 |
Ru nanodot synthesis using CO2 supercritical fluid deposition |
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
|
| 2013-05 |
Cu-Al alloy formation by Thermal annealing of Cu/Al multilayer Films deposited by Cyclic Metal Organic Chemical Vapor Deposition |
Metals and Materials International
|
| 2013-04 |
Synthesis of few-layered graphene nanoballs with copper cores using solid carbon source |
ACS APPLIED MATERIALS & INTERFACES
|
| 2013-01 |
Nanosheet thickness-modulated MoS2 dielectric property evidenced by field-effect transistor performance |
NANOSCALE
|
| 2013-01 |
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2 |
ECS Journal of Solid State Science and Technology
|
| 2012-12 |
Selective epitaxial growth of Si1-xGex films via the alternating gas supply of Si2H6, GeH4, and Cl2 : Effects of Cl2 exposure |
MATERIALS LETTERS
|
| 2012-10 |
Gap-filling of Cu-Al alloy into nanotrenches by cyclic metalorganic chemical vapor deposition |
MATERIALS RESEARCH BULLETIN
|
| 2012-09 |
Facile fabrication of ordered Si1-xGex nanostructures via hybrid process of selective epitaxial growth (SEG) and self-assembled nanotemplates |
JOURNAL OF ALLOYS AND COMPOUNDS
|
| 2012-06 |
MoS 2 nanosheet phototransistors with thickness-modulated optical energy gap |
NANO LETTERS
|
| 2012-06 |
광검출기 응용을 위하여 스퍼터된 미세결정 SiGe 박막성장 연구 |
전기전자재료학회논문지
|
| 2012-05 |
Low temperature atomic layer deposited Al-doped ZnO thin films and associated semiconducting properties |
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
|
| 2012-04 |
Silicide Formation of Atomic Layer Deposition Co using Ti and Ru Capping Layer |
한국재료학회지
|
| 2012-03 |
Silicidation of Co/Si Core Shell Nanowires |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2012-03 |
Initial Stage Growth during Plasma-Enhanced Atomic Layer Deposition of Cobalt |
CHEMICAL VAPOR DEPOSITION
|
| 2012-02 |
Selective Area Atomic Layer Deposited ZnO Nanodot on Self-Assembled Monolayer Pattern Using a Diblock Copolymer Nano-Template |
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
|
| 2012-01 |
n-ZnO:N/p-Si nanowire photodiode prepared by atomic layer deposition |
APPLIED PHYSICS LETTERS
|
| 2012-01 |
Supercritical Fluid Deposition of SiO(2) Thin Films : Growth Characteristics and Film Properties |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-10 |
Atomic Layer Deposition of Co Using N(2)/H(2) Plasma as a Reactant |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-08 |
Low-temperature Atomic Layer Deposition of TiO(2), Al(2)O(3), and ZnO Thin Films |
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
|
| 2011-08 |
Synthesis of Si Nanowires by Using Atmospheric Pressure Chemical Vapor Deposition with SiCl(4) |
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
|
| 2011-08 |
Characteristics and applications of plasma enhanced-atomic layer deposition |
THIN SOLID FILMS
|
| 2011-08 |
Electronic Structure of Cerium Oxide Gate Dielectric Grown by Plasma-Enhanced Atomic Layer Deposition |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-06 |
Low Pressure Chemical Vapor Deposition of Aluminum-Doped Zinc Oxide for Transparent Conducting Electrodes |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-06 |
Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-05 |
A HfO(2) Thin Film Resistive Switch Based on Conducting Atomic Force Microscopy |
ELECTROCHEMICAL AND SOLID STATE LETTERS
|
| 2011-05 |
Inductively Coupled-plasma Dry Etching of a ZnO Thin Film by Ar-diluted CF4 Gas |
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
|
| 2011-04 |
Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel |
APPLIED CATALYSIS B-ENVIRONMENTAL
|
| 2011-04 |
Atomic layer deposition ZnO:N flexible thin film transistors and the effects of bending on device properties |
APPLIED PHYSICS LETTERS
|
| 2011-03 |
The Effects of Ultraviolet Exposure on the Device Characteristics of Atomic Layer Deposited-ZnO:N Thin Film Transistors |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-02 |
In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition |
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
|
| 2011-02 |
Electrical and Optical Properties of Low Pressure Chemical Vapor Deposited Al-Doped ZnO Transparent Conductive Oxide for Thin Film Solar Cell |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
| 2011-02 |
The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD |
APPLIED SURFACE SCIENCE
|
| 2011-01 |
Programming and erasing operations of nitride-nitride-oxynitride stacked thin film transistor device |
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|