Prof. Kim's Research Team publication in Journal of materials chemistry C
Date
2018.04.03
Writer
전기전자공학부
게시글 내용
※ Prof. Hyun Jae Kim’s research team reported all-sputtered oxide thin-film transistors fabricated at 150oC using SUT treatment on Journal of Materials Chemistry C. The SUT treatment used in this study can effectively improve oxide film’s quality and reduce fabrication temperature. Furthermore, since SUT treatment is simpler than other treatments and easily applied in large-area substrate, it is expected to use next-generation treatments for oxide thin-film transistors.
※ This research was guided by Prof. Hyun Jae Kim (contact author) and led by graduate student Young Jun Tak (first author).
※ Prof. Hyun Jae Kim’s research team reported all-sputtered oxide thin-film transistors fabricated at 150oC using SUT treatment on Journal of Materials Chemistry C. The SUT treatment used in this study can effectively improve oxide film’s quality and reduce fabrication temperature. Furthermore, since SUT treatment is simpler than other treatments and easily applied in large-area substrate, it is expected to use next-generation treatments for oxide thin-film transistors.※ This research was guided by Prof. Hyun Jae Kim (contact author) and led by graduate student Young Jun Tak (first author).