모바일 메뉴 닫기
 

연구

Research & Laboratory

제목
세미나 [09/18] New Opportunities in Applications of Atomic Layer Deposition Films
작성일
2018.09.12
작성자
전기전자공학부
게시글 내용

< BK21 플러스 BEST 정보기술 사업단 세미나 개최 안내 > 

 

개최일시 : 2018년 9월 18일 화요일 16:00 ~ 17:00

개최장소 : 제4공학관 D406호

세미나 제목 : New Opportunities in Applications of Atomic Layer Deposition Films

내용 :

As the individual feature size of the electronic device rapidly shrinks, i.e., the packing density increases, nowadays, the need for high-quality thin film deposition techniques are increasing. Among various thin film deposition techniques, atomic layer deposition (ALD) offers unique characteristics that make itself suitable for fabricating high-quality ultra-thin films. Due to its self-limiting surface reaction mechanism, ALD can deposit extremely uniform thin films conformally over high-aspect-ratio structured surfaces with sub-nm-level thickness control. The thermal damage of the underlying device can also be minimized due to the low process temperature (<400℃) during ALD. Furthermore, plasma-enhanced ALD (PEALD), which utilizes highly reactive plasma species such as radicals or ions, offers greater process flexibility and a wider selection of materials than conventional thermal ALD. The use of plasma in PEALD greatly enhances the film crystallinity that can be crucial in device performance. Therefore, ALD and PEALD are providing new research ideas and engineering innovations in a variety of areas such as electronic devices, energy conversion devices, and functional coatings.

In this talk, recent research activities in Energy Nano-Tech Reseach (ENTeR) lab at SeoulTech regarding the design and manufacturing of ALD/PEALD systems/processes will be presented. Also the investigation on the non-conventional application examples of ALD films in the areas of mechanical (tribological and thermal) coating, energy conversion device (thin film solid oxide fuel cell), and information storage device (dynamic random access memory) will be discussed. The correlation between ALD process parameters and film performances in these applications will be elucidated, which may provide new ideas on wider applications of ALD films.

 

 

강연자 성함&직함 / 소속 : 안지환 교수 / 서울과학기술대학교

초청자 : 전기전자공학과 교수 김형준